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|Home||» Products||» Semiconductor Processing Equipments||» DC Magnetron Sputtering System|
DC Magnetron Sputtering System
Reactor: Stainless Steel 304L SS or 316 SS.
Magnetron Sputtering Cathode: Cathode has perfect design. Maximum power can be applied without much reflected power loss with perfect gas shower design.
Substrate :Heating arrangement maximum up to 400°C with substrate rotation facility
Gas Manifold: Made from SS tubes 316, Pneumatic ON/OFF valves, Particle filters & Mass flow controllers.
Pumping Line: High vacuum line, Pneumatic ON/OFF valves. Auto throttle valve with pressure controlled system ,
Vacuum System: Vacuum better than 10-5Torr. based Diffusion pump back by Rotary Vacuum pump, Penning Pirani vacuum gauges