Linear Antenna Based Large Area Microwave Plasma Enhanced Chemical Vapor
Deposition
Linear Antenna Based Microwave Plasma Enhanced Chemical Vapor Deposition (MW-PECVD) is suitable to nano -diamond,
polycrystalline diamond on 300 mmx300 mm substrate. The present system is also to grow diamond like nano-composite
(DLN) film on silicon solar cells which works as an antireflection coating
The system consists of the following sub-system
Edwards Turbo molecular pump model nEXT400D;
Edwards XDS35i Scroll Vacuum Pump .
Edwards Roots pump Model EH500 root;
RF POWER SUPPLY WITH AUTRO MATCHING NETWORK
GAS MANIFOLD MFC(4) and bellow shield valve(4)
Monometer capacitance gauge with readout ( Baratron )
Microwave –Plasma Array including Plasma applicator , Power supply etc. from Muegge GMBH
PLC HMI based electrical control panel