Call : +919811225389, +919873423522 Call : +919873423522
Home » Products » Scientific Instruments » Microwave Plasma Enhanced Chemical Vapor Deposition

Microwave Plasma Enhanced Chemical Vapor Deposition

Microwave Plasma Enhanced Chemical Vapor Deposition
Microwave Plasma Enhanced Chemical Vapor Deposition
Send Inquiry
Product Code : 04
Price And Quantity
  • Minimum Order Quantity
  • 1 Unit
  • Price
  • 740000 INR/Unit
Product Specifications
  • Material
  • Ms
  • Usage
  • laboratory
  • Application
  • Industrial
  • Voltage
  • 240 Volt (v)
  • Color
  • White
  • Power
  • 50 Watt (w)
  • Type
  • Chemical Vapor Deposition
  • Capacity
  • High
  • Display Type
  • Digital
Product Description

Linear Antenna Based Large Area Microwave Plasma Enhanced Chemical Vapor

Deposition



Linear Antenna Based Microwave Plasma Enhanced Chemical Vapor Deposition (MW-PECVD) is suitable to nano -diamond,

polycrystalline diamond on 300 mmx300 mm substrate. The present system is also to grow diamond like nano-composite

(DLN) film on silicon solar cells which works as an antireflection coating

The system consists of the following sub-system

  • Edwards Turbo molecular pump model nEXT400D;

  • Edwards XDS35i Scroll Vacuum Pump .

  • Edwards Roots pump Model EH500 root;

  • RF POWER SUPPLY WITH AUTRO MATCHING NETWORK

  • GAS MANIFOLD MFC(4) and bellow shield valve(4)

  • Monometer capacitance gauge with readout ( Baratron )

  • Microwave –Plasma Array including Plasma applicator , Power supply etc. from Muegge GMBH

  • PLC HMI based electrical control panel

Trade Information
  • Payment Terms
  • Cash on Delivery (COD)
  • Supply Ability
  • 1 Unit Per Month
  • Delivery Time
  • 1-2 Months
  • Main Domestic Market
  • All India

OMICRON SCIENTIFIC EQUIPMENT CO.
X


Back to top
OMICRON SCIENTIFIC EQUIPMENT CO. All Rights Reserved.(Terms of Use)
Developed and Managed by Infocom Network Ltd.