PECVD Equipment For Research And Development

Plasma enhanced chemical vapor deposition or PECVD Equipments for Research and Development are well known for their ergonomic design and utilization of cutting edge technology.   These systems are required for deposition of microcrystalline silicon and its alloys like silicon nitride and silicon carbide. Thin films formed by these equipments are used for LED products, sensors, transistors and photovoltaic cells to name a few. PECVD Equipments for Research and Development can be used at maximum 500 degree C operating temperature. These have mechanical process pressure controlling arrangement which is done by using capacitance manometer and throttle valve. These systems ensure to maintain uniformity of deposited substances.