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|Home||» Products||» Semiconductor Processing Equipments||» Plasma Etching System|
With an aim to fulfill varied needs of different industrial applications, we are affianced in providing technologically advanced Plasma Etching System. This system is manufactured using fine grade components with the use of ultra-modern technology in line with defined global market standards. Offered system is equipped with fully automated technology which helps in plasma processing that is used to fabricate integrated circuits. Further, this Plasma Etching System is excellent in functionality, due to this attribute offered system is widely demanded by our patrons.
High operational fluency
Easy to operate
Longer service life
Power: Frequency 13.56 MHz power level 300 watt
Vacuum Pump with Valve: Direct drive rotary vacuum pump, Pneumatic ON OFF valve with throttle valve, Pirani vacuum gauge with readout and KF 25 vacuum connector with vacuum hose.
Gas Manifold: Two line gas manifold with Rota-meter and on off valves
Input Power: 220 Volt, 50 Hz as Indian standard