Cathodic & Anodic Vacuum ARC Deposition System

 Cathodic & Anodic Vacuum ARC Deposition Systems are used for deposition of ceramic, composite and metallic films. Anodic version of arc deposition system is used for synthesis of nano materials in presence of atmospheric plasma at low temperature condition. PECVD equipments offered as part of Cathodic & Anodic Vacuum ARC Deposition Systems are used for deposition of vacuum thin film for creating a protective coating on applied surface.  Offered range of equipments offered under this category has been stringently tested on the basis of their longevity, technology used, power and voltage requirement and service life. This product range is accessible at reasonable rate from us.