High Temperature Microwave Plasma Processing System

High Temperature Microwave Plasma Processing System

100000 - 9500000 INR/Unit

Product Details:

  • Material ms
  • Voltage 240 Volt (v)
  • Color White
  • Power 50 Watt (w)
  • Application Industrial
  • Display Type Digital
  • Supply Ability : 4 Per Month
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Price And Quantity

  • 1 Unit
  • 100000 - 9500000 INR/Unit

Product Specifications

  • 50 Watt (w)
  • Industrial
  • Digital
  • ms
  • 240 Volt (v)
  • White

Trade Information

  • 4 Unit Per Month
  • 1-16 Week
  • All India

Product Description

High Temperature Microwave Plasma Processing System Microwave plasma processing system at atmospheric pressure is based on surfaguide design applicator. The Surfaguide is designed to be used equally in R&D laboratories and industry for a very large range of applications. Typical applications of such source are atmospheric high temperature chemistry, nano-powder synthesis, surface activation, gas abatement, gasification, sterilization tube. Moreover, in order to extend the operating conditions in the atmospheric pressure range and in the high power range, the dielectric tube has an air cooling possibility and the Surfaguide, water cooling.

The system consists of the following sub-systems

  • Sliding short WR 340,
  • Water cooled applicator ,
  • Three stub tuners
  • Launcher section WR 340 and the isolator with dummy load & power supply
  • An applicator, a screw feeder assembly is
  • Bottom side of an applicator a sample collection chamber
  • Bottom side of an applicator is covered with faraday cage
  • Non- contact pyrometer shall be used to measure the temperature of the flame & surrounding from Lumasense Technology or reputed manufactures.

Two Line Gas Manifold:

  • Two line gas manifold to accommodate MFC from Bronkhost make
  • Ar gas flow 0-10 LPM, 1% full scale accuracy, digital display with controlling tab
  • He gas flow 0-10 LPM, 1% full scale accuracy, digital display with controlling tab

Micro Screw Feeder details as given above sketch

 

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