Product Description
Microwave (2.45 GHz) ECR system
- PLC controlled microwave ECR system
- UHV SS vacuum chamber complete with vacuum pumping station including turbo pump based pumping
- Four line gas manifold with MFC
- 1.5 Kilowatt microwave power generator with forward and reflected power measurement, three stub tuner and special applicator with mode transfer facility
- The system is suitable for high rate etching oxides like silicon oxide and synthetic diamond deposition including Nano-diamond aligned carbon nanotubes & graphene