About Microwave Plasma Enhanced Chemical Vapor Deposition
Linear Antenna Based Large Area Microwave Plasma Enhanced Chemical VaporLinear Antenna Based Microwave Plasma Enhanced Chemical Vapor Deposition (MW-PECVD) is suitable to nano -diamond,polycrystalline diamond on 300 mmx300 mm substrate. The present system is also to grow diamond like nano-composite(DLN) film on silicon solar cells which works as an antireflection coatingThe system consists of the following sub-systemEdwards Turbo molecular pump model nEXT400D;Edwards XDS35i Scroll Vacuum Pump .Edwards Roots pump Model EH500 root;RF POWER SUPPLY WITH AUTRO MATCHING NETWORKGAS MANIFOLD MFC(4) and bellow shield valve(4)Monometer capacitance gauge with readout ( Baratron )Microwave Plasma Array including Plasma applicator , Power supply etc. from Muegge GMBHPLC HMI based electrical control panel
FAQs of Microwave Plasma Enhanced Chemical Vapor Deposition:
Q: What is the voltage requirement for the Microwave Plasma Enhanced Chemical Vapor Deposition system?
A: The voltage requirement for the product is 240 Volt (V).
Q: What type of display does this system have?
A: This system comes with a digital display.
Q: What is the power consumption of the Microwave Plasma Enhanced Chemical Vapor Deposition system?
A: The power consumption is 50 Watt (W).
Q: What material is used in the construction of this system?
A: The product is constructed from MS (Mild Steel).
Q: What is the primary application of this product?
A: The Microwave Plasma Enhanced Chemical Vapor Deposition system is designed for industrial applications.