About Plasma Etching System
With an aim to fulfill varied needs of different industrial applications, we are affianced in providing technologically advanced Plasma Etching System. This system is manufactured using fine grade components with the use of ultra-modern technology in line with defined global market standards. Offered system is equipped with fully automated technology which helps in plasma processing that is used to fabricate integrated circuits. Further, this Plasma Etching System is excellent in functionality, due to this attribute offered system is widely demanded by our patrons. Features: Hassle-free performanceHigh operational fluencyEasy to operateLonger service life Plasma Etching System Chamber: Aluminum.Power: Frequency 13.56 MHz power level 300 wattVacuum Pump with Valve: Direct drive rotary vacuum pump, Pneumatic ON OFF valve with throttle valve, Pirani vacuum gauge with readout and KF 25 vacuum connector with vacuum hose.Gas Manifold: Two line gas manifold with Rota-meter and on off valvesInput Power: 220 Volt, 50 Hz as Indian standard
FAQs of Plasma Etching System:
Q: What is the voltage requirement for the Plasma Etching System?
A: The Plasma Etching System requires a voltage of 260 Volt (V).
Q: What material is used in the construction of the Plasma Etching System?
A: The Plasma Etching System is constructed using MS (Mild Steel).
Q: What is the power consumption of the Plasma Etching System?
A: The Plasma Etching System consumes 40 Watt (W) of power.
Q: What type of display does the Plasma Etching System feature?
A: The Plasma Etching System is equipped with a digital display.
Q: What is the primary application of the Plasma Etching System?
A: The Plasma Etching System is primarily designed for industrial applications.