About RF Plasma Atomic Beam Etching
RF Plasma Assisted Fast Atom Beam EtchingMild steel made RF Plasma Atomic Beam Etching equipment is used as an integral part of plasma treatment technique used during manufacturing of semi conductor systems. As part of this technique, highly reactive and energetic materials produced from different process gases like oxygen tend to react with the sample surface. As its consequence, surface materials break down to small molecules that are finally removed by applying vacuum force. RF Plasma Atomic Beam Etching equipment offered by us has digital display arrangement. It required 240 v voltage and 50 watt power to function. Long working life is one of the key aspects of this etching system.
FAQs of RF Plasma Atomic Beam Etching:
Q: What is the voltage requirement for the RF Plasma Atomic Beam Etching machine?
A: The RF Plasma Atomic Beam Etching machine operates at 240 Volt (v).
Q: What is the power consumption of this product?
A: The power consumption of the RF Plasma Atomic Beam Etching machine is 50 Watt (w).
Q: What is the material used in the construction of this machine?
A: The RF Plasma Atomic Beam Etching machine is constructed using MS (Mild Steel).
Q: What type of display does the machine feature?
A: The RF Plasma Atomic Beam Etching machine features a digital display.
Q: Is this product suitable for industrial applications?
A: Yes, the RF Plasma Atomic Beam Etching machine is designed for industrial applications.