About Mw Pecvd System
We are a leading manufacturer, exporter and supplier of optimum quality Mw Pecvd System. Our provided machine is PLC controlled microwave plasma used for enhancing the efficiency of chemical vapor deposition system. The offered system is manufactured with the help of cutting-edge technology by making use of supreme grade components under the stern guidance of deft team of professionals at our well-equipped production unit. Moreover, this Mw Pecvd System is available in different specifications to meet the specific requirements of our customers. Features: Accurate result display High operational fluency User friendly design Impeccable performance MW PECVD SYSTEM: PLC controlled microwave plasma enhanced chemical vapor deposition systemSS chamber complete with vacuum pumping stationFour line gas manifold with MFC1.5 Kilowatt microwave power generator with forward and reflected power measurement, three stub tuner and special applicator with mode transfer facilityThe system is suitable to process various semiconductor thin films starting from diamond like carbon to diamonds including aligned carbon nanotubes graphene
FAQs of Mw Pecvd System:
Q: What type of display does the MW PECVD System have?
A: The MW PECVD System is equipped with a digital display.
Q: What is the voltage requirement for the MW PECVD System?
A: The MW PECVD System operates at a voltage of 240 Volts (V).
Q: What material is used in the construction of the MW PECVD System?
A: The MW PECVD System is made from MS (Mild Steel).
Q: What is the power consumption of the MW PECVD System?
A: The MW PECVD System consumes 50 Watts (W) of power.
Q: What is the primary application of the MW PECVD System?
A: The MW PECVD System is designed for laboratory applications.