PECVD Equipment For Research And DevelopmentPlasma enhanced
chemical vapor deposition or PECVD Equipments for
Research and Development are well known for their ergonomic design and
utilization of cutting edge technology. These systems are required for deposition of
microcrystalline silicon and its alloys like silicon nitride and silicon
carbide. Thin films formed by these equipments are used for LED products,
sensors, transistors and photovoltaic cells to name a few. PECVD Equipments for
Research and Development can be used at maximum 500 degree C operating
temperature. These have mechanical process pressure controlling arrangement
which is done by using capacitance manometer and throttle valve. These systems
ensure to maintain uniformity of deposited substances.
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OMICRON SCIENTIFIC EQUIPMENT CO.
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