PECVD with Load Lock System

PECVD with Load Lock System

100000 - 9500000 INR/Unit

Product Details:

X

Price And Quantity

  • 100000 - 9500000 INR/Unit
  • 1 , , Unit

Trade Information

  • 4 , , Unit Per Month
  • 1-16 Week

Product Description

PECVD with Load Lock System is used for execution of plasma enhanced chemical vapor deposition procedure in semiconductor arena. Utilization of this system can also be noticed in microelectronics arena. Vacuum loadlock of this system has significant role in the production of low stress films. Liquid delivery source like tetraethylorthosilicate or TEOS is used during PCVVD procedure to promote deposition of doped as well as undoped silicon dioxide film. This entire process is carried out at low temperature and low internal stress based condition. PECVD with Load Lock System is equipped with ergonomic chamber and process controlling section for its production of standard quality film.

 

Enter Buying Requirement Details
Email Id
Mobile number

Other Products in 'PECVD Equipment for Research and Development' category



Back to top
OMICRON SCIENTIFIC EQUIPMENT CO. All Rights Reserved.(Terms of Use)
Developed and Managed by Infocom Network Private Limited.