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MW PECVD SYSTEM WITH RF BIASED & HEATING
Microwave plasma enhanced chemical vapor deposition system
UHV SS chamber complete, turbo pump based vacuum pumping, throttle valve and pirani and penning vacuum gauges etc.
Four line gas manifold with Mass Flow Controllers.
1.2 Kilowatt microwave power generator, three stub tuner, E-bend , mode transfer from rectangular to circular with quartz plate MW power transfer in to vacuum chamber
Substrate RF biased with heating arrangement
The system is suitable to deposit polymer to diamond including diamond like carbon, Nano-diamond aligned carbon nanotubes & various other semiconductor thin films.