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Mw Pecvd System

Mw Pecvd System
Mw Pecvd System
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Product Code : 11
Product Description

MW PECVD SYSTEM WITH RF BIASED & HEATING

Microwave plasma enhanced chemical vapor deposition system

UHV SS chamber complete, turbo pump based vacuum pumping, throttle valve and pirani and penning vacuum gauges etc.

Four line gas manifold with Mass Flow Controllers.

1.2 Kilowatt microwave power generator, three stub tuner, E-bend , mode transfer from rectangular to circular with quartz plate MW power transfer in to vacuum chamber

Substrate RF biased with heating arrangement

The system is suitable to deposit polymer to diamond including diamond like carbon, Nano-diamond aligned carbon nanotubes & various other semiconductor thin films.

 


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