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Mw Pecvd System

Mw Pecvd System

Product Details:

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Product Description

MW PECVD SYSTEM WITH RF BIASED & HEATING

  • Microwave plasma enhanced chemical vapor deposition system
  • UHV SS chamber complete, turbo pump based vacuum pumping, throttle valve and pirani and penning vacuum gauges etc.
  • Four line gas manifold with Mass Flow Controllers.
  • 1.2 Kilowatt microwave power generator, three stub tuner, E-bend , mode transfer from rectangular to circular with quartz plate MW power transfer in to vacuum chamber
  • Substrate RF biased with heating arrangement
  • The system is suitable to deposit polymer to diamond including diamond like carbon, Nano-diamond aligned carbon nanotubes & various other semiconductor thin films.

 


OMICRON SCIENTIFIC EQUIPMENT CO.

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